光罩檢測

微技術領域中,光罩檢測(英語:mask inspection)是檢查光罩製作正確性的操作技術[1]。用於定位光罩缺陷的是高級自動化系統,如掃描電子顯微鏡[2]。「光罩檢測」一詞也可能非正式地指稱真正寫入光罩前的光罩資料檢測mask data inspection[3]

半導體光罩

參考文獻

  1. ^ "VLSI technology: fundamentals and applications", by Yasuo Tarui, 1986, ISBN 3-540-12558-2, Chapter 4: "Mask Inspection Technology"
  2. ^ ZEISS Webpage offering automated mask repair tools
  3. ^ "Design for manufacturability and yield for nano-scale CMOS", by Charles Chiang, Jamil Kawa, 2007, ISBN 1-4020-5187-5, p. 237